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, 2 with anisotropic displacement parameters for all non-hydrogen atoms

, Solar cell device fabrication in Japan: PSCs were fabricated on FTO-coated glass with the sheet resistance of FTO approximately 7 ? cm -2 . Initially, FTO electrodes were patterned by etching FTO with 2 M HCl and zinc powder. Substrates were then cleaned sequentially in detergent, water, ethanol and acetone. After UV-induced ozone treatment, for 30 min. A 300-nm thick mesoporous TiO 2 (DSL 18NR-T, DYESOL) film was spin

, After transferring the films to a N 2 -filled glove box, the perovskite layers were then deposited by spin-coating a mixed precursor solution of methylammonium iodide and lead Iodide (1:1 molar ratio, final concentrations 1.1 M lead Iodide and 1.1 M methylammonium iodide) in dimethylsulphoxide (DMSO) at speed of 1000 r

. Sequence, 6-TPA HTM in chlorobenzene at solid concentration of 37.3 mg/mL was spin-cast onto CH 3 NH 3 PbI 3 perovskite layer speed of 3000 r.p.m. for 30s. To improve the charge carrier mobility of HTM layers as well the photovoltaic performance of PSCs, the HTM solutions were added 24 ?L of 4-tert-butylpyridine (96%, Sigma-Aldrich), 14 ?L lithium bis (trifluoromethanesulfonyl)imide (LiTFSI, Tokyo chemical industry) solution (516.7 mg LI-TSFI in 1 ml acetonitrile, 99, vol.8

, Substrates were then cleaned sequentially in detergent, water, ethanol and acetone. After UV-induced ozone treatment, a compact layer of TiO 2 (around 50 nm in thickness) was deposited by spin coating a solution of 100 ?L titanium diisopropoxide bis(acetylacetonate) (Sigma-Aldrich) in 1.27 mL of 1-butanol at speed of 2800 r.p.m. for 25s and annealed at 125 ºC for 5 min, cobalt(III) bis(trifluoromethylsulphonyl)imide (FK209, Luminescence Technology Corp.) solution (3751)

, In ambient temperature, the perovskite layers were then deposited by spin-coating a mixed precursor solution of MAI and PbI 2 (1:1 molar ratio) in DMSO and DMF at speed of 4000 r.p.m. for 25s. After 10s spinning, r.p.m. for 20s and annealed at 125 ºC for 5 min, then calcinated at 500 ºC for 60 min in air to remove organic components, vol.8